"Scanning Probe Microscope Drift Measurement Method" International Standard Released

Recently, the International Standard "Scanning Probe Microscope Drift Measurement Method (ISO11039:2012)", presided over by Professor Huang Wenhao of the School of Engineering Science, University of Science and Technology of China, has been formally released by the International Organization for Standardization.

Since the invention of Scanning-probe microscopy (SPM) in the 1980s, due to its atomic-scale resolving power, it has greatly promoted the development of nano-science and technology and has gradually formed a high-tech industry. The working principle of SPM is to scan the surface of the sample with a tiny probe, and the interaction between the probe and the sample surface is converted into a surface topography and characteristic image. Due to the slow scanning speed, the drift phenomenon is common during the scanning process, which restricts the further application of SPM in nanometer measurement and nanometer processing.

Professor Huang Wenhao has been engaged in the research and development of nanotechnology and precision instruments for the past 20 years. In 2006, he proposed to the International Organization for Standardization ISO/TC201 (Technical Committee on Surface Chemistry Analysis) a proposal for a "Standard for Measurement of Scanning Probe Microscope Drift Rate Measurements" in order to measure the size and direction of nanometer/second drift when working with SPM. Measured to regulate the use of this type of instrument. In 2007, the proposal was formally approved. Professor Huang Wenhao was designated as the convener of the project team. After more than four years of hard work, the final draft of the SPM drift measurement method standard was successfully passed by all member states in 2011 and was officially released in 2012.

The standard defines technical terms describing the rate of SPM drift in the X, Y, and Z directions, specifies the measurement method and measurement procedure for the SPM drift rate, and places stringent requirements on the instrument's function, working environment, and measurement report content. This standard specifies the effective parameter specifications for the drift rate for SPM instrument manufacturers and helps the user understand the stability of the instrument in order to design an effective experiment. The standard not only applies to the drift rate evaluation method based on SPM measurement images, but also has important reference value for the evaluation of the stability of other nanometer measuring instruments.

The related research work was supported by the National Natural Science Foundation of China, the important directional project of the Knowledge Innovation Project of the Chinese Academy of Sciences and the 973 project of the Ministry of Science and Technology.