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The film is formed by vacuum evaporation on a surface of a substrate (PET, nylon, etc.) coated with a thin layer of a silicon oxide film (SiOX, X<2) having a thickness of about 10 nm. By optimizing the film formation conditions of the silicon oxide film, a fine film was formed. Compared with the company's original "TECHBARRIER", the new film's water vapor barrier rate increased by 2 to 3 orders of magnitude. This value "belongs to the highest level in the world" (the company).
This product can be used in organic EL panels, electronic paper and other next-generation displays and organic solar cells, which can significantly increase the reliability of components. And flexible panels can also be implemented. In addition, roll-to-roll production can also be used to significantly reduce costs.
The company plans to achieve sales of 5 billion yen in sales including advanced medical and pharmaceutical packaging materials after 3 years. In addition, the development will continue in the future, and strive to increase the barrier property of water vapor by 1-2 orders of magnitude after 3 years.
Mitsubishi Plastics Releases High-barrier Functional Film
On June 25, Mitsubishi Plastics released a transparent gas barrier film “X-BARRIER†with a water vapor transmission rate of 10-4 g/(m2·d) and a relatively high barrier property. The film has barrier properties to various gases such as oxygen and carbon dioxide. According to user requirements, we can customize materials that have heat resistance, high temperature and humidity resistance, weather resistance and bending resistance. Samples have already begun to be evaluated and will be officially listed on July 1. In addition to flexible organic EL displays and organic solar cells, the product is also expected to be used in cutting-edge medical and pharmaceutical packaging materials.